S&S TECH CO., LTD.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 995

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2016/0054,650 PHASE-SHIFT BLANKMASK AND PHOTOMASKJul 21, 15Feb 25, 16[G03F]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9851632 Phase-shift blankmask and photomaskJul 21, 15Dec 26, 17[G03F]
9551925 Blankmask and photomask using the sameJan 23, 15Jan 24, 17[G03F]
9482940 Blankmask and photomaskOct 01, 14Nov 01, 16[G03F]
9389500 Mask blank, photomask, and method for manufacturing sameOct 26, 12Jul 12, 16[G03F]
9256119 Phase-shift blankmask and method for fabricating the sameApr 17, 13Feb 09, 16[G03F]
9229317 Blankmask and method for fabricating photomask using the sameJun 27, 13Jan 05, 16[G03F]
8846276 Blankmask and photomask using the sameOct 17, 12Sep 30, 14[G03F]

Expired/Abandoned/Withdrawn Patents

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Top Inventors for This Owner

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